Horiba Ir-400 Series Gas Monitor Instruction Manual

IR-400 Series Gas Monitor

Gas Monitor IR-400 Series

Chamber cleaning end point monitoring for deposition process

Product Features

• Multi gas monitoring
• High sensitivity
• Gas cell heating function
• Analog/Digital communication
• Multi-display

Product Specifications

Product Usage Instructions

The Gas Monitor IR-400 Series is designed for chamber cleaning
end point monitoring in deposition processes. It offers the
following benefits:

• Reduces time for chamber cleans
• Reduces usage of cleaning gases
• Provides a repeatable and predictable clean process
• Ensures longer lifetime of chamber components

Reliable, High-performance Non-dispersive Infrared
Absorptiometry (NDIR)

The Gas Monitor IR-400 Series uses the infrared absorptiometry
method based on the absorption of infrared light by gas molecules.
It employs a double beam method for stable and accurate measurement
results.

Optical System

The optical system consists of a light source, gas cell, and
double beam detectors. The stability of the double beam detector
has been proven over a period of more than 40 years.

• Light source
• Gas cell
• Optical filter (Sample)
• Sample output
• Preamplifier
• Reference output
• Sensor element
• Pyroelectric infrared detector
• Optical filter (Reference)
• Double beam detectors
• Absorbance
• Reference detector
• Sample detector
• Wavelength

When the sample gas is flowing, only the sample detector output
changes. When the sample gas is not flowing, the reference and
sample detector outputs are the same.

Note: The specifications mentioned above are guaranteed under
HORIBA STEC’s inspection conditions using calibration gas. “Clean
S” is a registered trademark of Resonac Corporation.

Gas Monitor IR-400 Series
Chamber cleaning end point monitoring for deposition process

IR-427

IR-437

Reduce time for chamber cleans Reduce usage of cleaning gases Repeatable and predictable clean process Longer lifetime of chamber components

Features

Multi gas monitoring

High sensitivity

Gas cell heating function

Analog/Digital communication

Multi-display

Product Specifications

Model
Measurement gas and full scale Cell length
Cell set temperature Heater jacket Repeatability *1 Linearity *1 Zero noise *1
Ambient temperature Storage temperature
Warm-up time
Wetted material
Fitting Leak rate Proof pressure

IR-422

IR-432

SiF4: 100 mTorr, CF4: 100 mTorr WF6: 200 mTorr, NF3: 200 mTorr

SiF4: 3800 mTorr

200 mm

30 mm

180 Temperature sensor: Thermocouple K-type, Thermostat: Manual reset

±0.5 %F.S.

±1 %F.S.

±0.5 %F.S. (3)

20-35

0-70 120 min

20-50

SUS316L, BaF2, FFKM

SUS316L, ZnSe, FFKM

SUS316L (Clean S® treatment AF type *2), BaF2, FFKM

NW25

1 × 10-6 Pa · m3/s (He)

300 kPa (A)

Analog communication

Analog output: 0-5 VDC Contact output: Error, HighLow alarm,
Warm-up status Contact intput: Zero calibration

Analog output: 4-20 mA Contact output: Error, HighLow alarm,
Warm-up status Contact intput: Zero calibration

Digital communication

Power supply

Sensor Heater jacket

Dimensions (mm)

Weight

RS-485 (F-Net Protocol) 24 VDC, 1.5 A
208 V, 84 VA W433 × H117.5 × D83
3.2 kg

*1 The specifications are guaranteed under HORIBA STEC’s inspection conditions using calibration gas. *2 Clean S is a registered trademark of Resonac Corporation.

115 V, 132 VA W259 × H130 × D86
2.8 kg

Model

IR-427

IR-437

Measurement gas and full scale Cell length
Cell set temperature Heater jacket Repeatability *1 Linearity *1 Zero noise *1
Ambient temperature Storage temperature
Warm-up time

Wetted material

Fitting

Leak rate

Proof pressure

Digital communication

Power supply

Sensor Heater jacket

Dimensions (mm)

Weight

SiF4: 100 mTorr, CF4: 100 mTorr WF6: 200 mTorr, NF3: 200 mTorr

SiF4: 3800 mTorr

200 mm

30 mm

180 Temperature sensor: Thermocouple K-type, Thermostat: Manual reset

±0.5 %F.S.

±1 %F.S.

±0.5 %F.S. (3)

20-35

0-70 120 min

20-50

SUS316L, BaF2, FFKM

SUS316L, ZnSe, FFKM

SUS316L (Clean S® treatment AF type *2), BaF2, FFKM

NW25

1 × 10-6 Pa · m3/s (He)

300 kPa (A)

EtherCAT® Protocol

24 VDC, 1.5 A

208 V, 84 VA

115 V, 132 VA

W433 × H117.5 × D83 3.2 kg

W259 × H130 × D86 2.8 kg

*1 The specifications are guaranteed under HORIBA STEC’s inspection conditions using calibration gas. *2 Clean S is a registered trademark of Resonac Corporation.

Reliable, High-performance Non-dispersive Infrared Absorptiometry (NDIR)
The infrared absorptiometry method employed by the IR-300 Series uses the principle of the absorption by gas molecules of the infrared light emitted from an infrared light source. The sample output from a sample that has absorbed the gas being measured is compared to a reference output with no absorbance, and the result is converted into a gas concentration. The use of this double beam method enables long-term, stable measurement results to be obtained.

Light source Gas cell

Optical filter(Sample) Sample output
Preamplifier
Reference output Sensor element Pyroelectric infrared detector Optical filter(Reference)
Double beam detectors

Absorbance

Reference detector

Sample detector

Wavelength

When the sample gas is flowing, only the sample detector output changes.
When the sample gas is not flowing, the reference and sample detector outputs are the same.

The optical system is made up of a light source, gas cell and double beam detectors. The stability of the double beam detector has been proven over a period of more than 40 years.

Application Examples

Process chamber Plasma

Support products

MFC

of exhaust line

IR-400 Series : Chamber cleaning end point monitoring for deposition process
VG Series : Pressure monitoring of exhaust line

Capacitance manometer

Exhaust valve

PV Series : Chamber pressure control by N2 ballast control

Vacuum pump

Piezo actuator valve
PV IR-400

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The contents of this catalog are subject to change without prior notice, and without any subsequent liability to this company. It is strictly forbidden to copy the content of this catalog in part or in full. All brand names, product names and service names in this catalog are trademarks or registered trademarks of their respective companies.

horiba.com/semiconductor

HEAD OFFICE 11-5, Hokotate-cho, Kamitoba, Minami-ku, Kyoto, 601-8116 Japan Phone: (81) 75-693-2300Fax: (81) 75-693-2350

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Please read the operation manual before using this product to ensure safe and proper handling of the product.

CHINA HORIBA Instruments (Shanghai) Co., Ltd.
Phone: (86) 21-6952-2835Fax: (86) 21-6952-2823
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U.K. HORIBA UK Limited
Phone: 44 (0) 1604 542500Fax: 44 (0) 1604 542699 Mail: [email protected]
GERMANY HORIBA Europe GmbH
Oberursel Office Phone: (49) 6172 1396-0
Dresden Office Phone: (49) 351/889 68 07

Bulletin:IR4-DE

Printed in Japan 2304SK00

References

• HORIBA Semiconductor Manufacturing and Advanced Materials